Atomic Layer Deposition Equipment Market Demand for Advanced Fabrication Tools in Nanotechnology


​In the forthcoming years, the market will also gain momentum from the increasing demand for copper deposition equipment in memory devices. On the flip side, stringent regulatory controls on exports and high initial investment required to procure Atomic Layer Deposition Equipment Market will limit their sales globally. The absence of skilled human resource and the slow deposition rate of ALD equipment are also likely to curb growth to some extent.

Nevertheless, with the proliferation of ALD across flexible electronics, hydrophobic coatings, and electronic textiles, ALD equipment manufacturers are expected to witness positive opportunities to sustain their growth-run. Furthermore, leading players are also expected to capitalize on the increasing application of ALD across power and energy storage devices.

Application of ALD Equipment in Semiconductor Processing to Rise Considerably

Based on type, the aluminum oxide ALD segment accounted for 37% of the global Atomic Layer Deposition Equipment Market in 2015. Aluminum oxide, being a highly stable and robust material, is extensively used in research for a plethora of applications in micro and optoelectronics. By application, the semiconductors and electronics segment accounted for the largest share in the market. Demand for ALD equipment for semiconductor processing is high because of the increasing use of the technology in the manufacture of smartphones and other electronic gadgets.

This 263 page report gives readers a comprehensive overview of the Atomic Layer Deposition Equipment Market. Browse through 41 data tables and 33 figures to unlock the hidden opportunities in this market:

Regionally, Asia Pacific emerged at the fore of the global atomic layer deposition equipment market, with a share of 57.2% in 2015. The region owes its dominance to the rapid expansion of its industrial sector, which has been translating into high sales prospects for ALD equipment. Furthermore, companies operating in APAC are also capitalizing on the easy availability of cheap skilled labor and favorable government subsidies.

TMR says that the sales of ALD equipment in Asia Pacific will rise at an impressive CAGR of 29.9% between 2016 and 2024. According to the report, the global atomic layer deposition equipment market was valued at US$875.0 mn in 2015 and is anticipated to reach US$8.58 bn by 2024, at a CAGR of 29.4% from 2016 to 2024.

The presence of a large number of international and local companies is boosting competition in the global Atomic Layer Deposition Equipment Market. As per a new study by Transparency Market Research (TMR), the competition prevailing in the market is expected to intensify further between 2016 and 2024. As of 2015, ASM International N.V., Applied Materials, Inc., and Tokyo Electron Ltd. cumulatively held a share of 58.9% in the global market. Of these, ASM International N.V. emerged as the top player, accounting for over 28% of the global Atomic Layer Deposition Equipment Market in 2015. Rivalry among key players in terms of product development and technology and product upgrades is expected to intensify during the forecast period.

“Due to the recent advancements in the atomic layer deposition technology, the use of ALD equipment has considerably increased in the nanotechnology sector,” says a lead analyst at TMR. TMR expects applications of ALD equipment as manipulation and fabrication tools in nanotechnology to rise further in the short term. “Growing concerns pertaining to carbon emissions have accelerated investment in the R&D of photovoltaics. Due to the increasing research and development activities, the use of ALD as a PV manufacturing method has substantially expanded,” adds the analyst. This rising demand for photovoltaic cells, combined with rapid advancements witnessed in PV technology, will subsequently augment sales of ALD equipment in the forthcoming years.


Most Lucrative Atomic Layer Deposition Equipment Market

Globally, electronic device components are being pushed towards micro spatially demanding structures. With the gradual movement towards the limit of Moore’s Law, several research and development (R&D) programs are ongoing in pushing the limit of Moore’s law. Thin film deposition techniques aid the semiconductor industry in performing the same. It is a process of creating a thin layer on top of a substrate or on top of another ‘thin film’. The thickness of the films can range between nanometers to micrometers. Thin film deposition is currently in very high demand and enormous amount of R&D is also ongoing to develop the process further. It is currently being used for various different applications, such as printed electronics, energy generation, optical coatings and energy storage among others. Thin film deposition process can be broadly divided in to Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD). Atomic Layer Deposition (ALD) is considered to be a type of CVD. Both CVD and PVD have various different techniques, advantages and disadvantages. Additionally, continuing technological advancements, has led to the possibility of deposition of different materials on required substrates.

Growing application of Atomic Layer Deposition (ALD) thin film coating techniques in the fabrication of a variety of electronic devices and components in the semiconductor industry is one of the major driving factors of the market. ALD technique can also be used to encapsulate devices against oxygen, moisture, and impurities in order to ensure long and failure-free operation. Apart from this, ALD has potential applications in industrial production processes which include biocompatible coatings for medical applications, solar cell efficiency enhancement, anti-tarnishing of coins and jewelry, and powder-based catalyst materials among others.

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Based on type, the market is segmented intoAluminum Oxide (Al2O3) ALD, Catalytic ALD, Metal ALD, ALD on Polymers and others.Alumina is one of the most studied ALD coated material. Aluminum oxide (Al2O3) is a highly robust and stable material, and has been extensively researched for a wide range of applications in micro and optoelectronics.Furthermore, by application the market is segmented into semiconductor and electronics and research and development facilities. Geographically, the global atomic layer deposition equipment market is categorized into North America, Europe, Asia Pacific, Latin America, Middle East and Africa. The scope of the report offers an insight into ALD equipment market in these regions based on revenue (USD million).

The competitive profiling of the key players in the global ALD equipmentmarket across major geographic regions is included in the study. These include diverse business strategies adopted by the leading players and their recent developments as in the field of ALD equipment.

A comprehensive analysis of the market dynamics that is inclusive of market drivers, restraints and opportunities is included in the purview of the report. Market dynamics are the distinctive factors which impact the market growth, thereby helping to understand the ongoing trends of the global market. The report provides the forecast of the global market for the period from 2016 to 2024, along with offering an inclusive study of the ALD equipment market.

Technology innovation and development is one of the key strategies adopted by most leading players. New product innovation is required to deal with the existing competition in the market. Some major players in the atomic layer deposition equipment market in Asia Pacific, North America, Europe, Latin America, Middle East and Africa include ASM International N.V. (The Netherlands), Aixtron SE (Germany), Entegris, Inc.(The U.S.), Picosun Oy (Finland), CVD Equipment Corporation (The U.S.), Arradiance, Inc.(The U.S.), ALD Nanosolutions, Inc. (The U.S.), Beneq Oy (Finland), Veeco Instruments, Inc. (The U.S.), Applied Materials, Inc. (The U.S.), Oxford Instruments Plc (U.K.), SENTECH Instruments GmbH (Germany),Encapsulix (France), Kurt J. Lesker Company (The U.S.), Ultratech Inc. (The U.S) among others.

Atomic Layer Deposition Equipment Market-Industrial Expansion to Create New Opportunities

The global Atomic Layer Deposition Market has reported strong growth in the last few years. Transparency Market Research (TMR) forecasts that the market will continue to exhibiting steady growth between 2016 and 2024 as the use of the ALD technology increases in the production of smartphones, DVD players, printers, and other electronics. A few of the key applications of atomic layer deposition include industrial, biomedical, video games, portable media players, microelectronics, and quality control.

The global ALD equipment market stood at US$875.0 mn in 2015. Exhibiting a CAGR of 29.4% between 2016 and 2024, the market is poised to reach US$8.58 bn by the end of 2024.

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Industrial Expansion to Create New Opportunities for ALD Equipment in Asia Pacific

From the geographic standpoint, North America, Asia Pacific, Europe, Latin America, and the Middle East and Africa constitute the most lucrative markets for ALD equipment. Among these, Asia Pacific has emerged as the leading regional market due to the increasing application of ALD across core industries. The region held approximately 57.2% of the global ALD equipment market in 2015 in terms of revenue.

As per TMR, the rapid expansion of the automotive, electronics, and semiconductor industries will stimulate demand for ALD equipment in Asia Pacific. The regional market is also likely to gain from the rising demand from medical centers. According to TMR, the Asia Pacific ALD market, which stood at US$500.5 mn in 2015, is expected to reach US$5.1 bn by the end of 2024. The market is expected to exhibit a CAGR of 29.9% during the forecast period. The increasing use of ALD equipment across industrial set ups is also expected to boost its sales in North America.

Applications in Nanotechnology to Boost Opportunities for ALD Equipment Market

In the last few years, the use of atomic layer deposition has significantly increased in nanotechnology. The recent technological advancements in the ALD technology in terms of scalability, performance, and reliability have made this possible. With the advent of more advanced technologies, the usage of ALD equipment as manipulation and fabrication tools in nanotechnology is expected to accelerate. Furthermore, the sales of ALD equipment are poised to surge due to the rising demand for less time consuming and effective semiconductor equipment manufacturing process.

However, the process of ALD is very time consuming, which indirectly acts as a growth suppressant for the ALD equipment sales. The stringent export control regulations are also expected to create bottlenecks for the market. Besides this, the high initial investment required for ALD equipment and the lack of skilled workforce also inhibit the growth in ALD equipment sales to an extent.

Nevertheless, the increasing applications of ALD in semiconductor and electronics and energy devices is expected to keep the demand for ALD equipment high in the forthcoming years. The increasing research and development on atomic layer deposition technologies is projected to boost opportunities for the ALD equipment market. The market is also expected to significantly gain from the increasing application of atomic layer deposition in power devices and energy storage devices.